Titanium Round Target
Item: Titanium Round Target, Titanium Target
Standard: ASTM B348 Gr2
Material: Gr2 Titanium.
Specifications: Dia 100x45mm, Dia 100x40mm, Dia 80x40mm
Shape: Round, Plate, Tube
We can supply titanium round target,as cumstomer's requirement
Application: Used in semiconductor separation device, plane display, storage electrode film, sputtering
coating, workpiece surface coating, glass coating industry, etc.
Product Introduction
The coating target is a sputtering source that is sputtered onto the substrate to form a functional thin film through magnetron sputtering or other coating systems under appropriate process conditions. In other words, the target material is a target material bombarded by high-speed charged particles. When used in high-energy laser weapons, different power densities, different output waveforms, and different laser wavelengths will interact with different target materials to produce different killing effects. and destructive effects.
The manufacturing of titanium sputtering targets includes preparation of raw material powder, preheating, hot pressing, processing, and surface treatment. The preparation of raw materials is the key to ensuring the quality of titanium sputtering targets. Preheating and hot pressing are important process steps for manufacturing titanium sputtering targets, through which uniform and dense materials are obtained to ensure the physical and chemical properties of the target. Processing includes cutting, shaping and polishing. Surface treatment includes cleaning, passivation, packaging, etc.
Advanced technology and longer service life. Due to its high performance, titanium round targets play an important role in semiconductor separation devices, flat panel displays, storage electrode films, workpiece coating, glass coating industry and other fields.
Titanium round target has a wide range of uses due to the wide band gap, low dielectric constant, and temperature stability. The thin film is mainly prepared by magnetron sputtering, in which the target material is an important basic raw material in the sputtering coating process. Equipped with excellent and supersonic plasma spraying technology, it has a high heat source temperature and an inert air atmosphere. The spraying distance is small. The particles fly in the plasma jet at a high speed, less likely to be oxidized in the medium, with advantages for spraying easily oxidizable titanium powder.
the detailed specifications as followings:
|
Grade |
Gr2 |
|
Shape |
Round/Plate/Tube |
|
Purity |
Titaniim:99.8% |
|
Density |
4.51 or 4.50 |
|
Material |
Gr2 |
|
Round target |
Dia: 20-300mm Thickness: 10-80mm |
|
Plate Target |
Length: 315.5-601.6mm Width: 31.5-304.8mm Thickness: 3-30mm |
|
Tube target |
Dia: 30-200mm Thickness: 5-20mm Length: 500-2000mm |
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